Line-profile and critical-dimension correlation between a normal-incidence optical CD metrology system and SEM

Line-profile and critical-dimension correlation between a normal-incidence optical CD metrology system and SEM

著者名:

Yang, W. ( Nanometrics Inc. (USA) )

Lowe-Webb, R.

Korlahalli, R.

Zhuang, V.G.

Sasano, H. ( Applied Materials, Inc. (USA) )

Liu, W.

Mui, D.

さらに 2 件

掲載資料名:

Metrology, Inspection, and Process Control for Microlithography XVI

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4689

発行年:

2002

巻:

Part Two

開始ページ:

966

終了ページ:

976

総ページ数:

11

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444356 [0819444359]

言語:

英語

請求記号:

P63600/4689

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012522
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Metrology, inspection, and process control for microlithography
回次:	2002 : 16th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2002.03.04-2002.03.07

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