Environmental control for lithography with 157-nm exposure

Environmental control for lithography with 157-nm exposure

著者名:

Kitano, J. ( Tokyo Electron Ltd. (Japan) )

Kiba, Y. ( Tokyo Electron Kyushu Ltd. (Japan) )

Inazawa, K. ( Tokyo ElectronAT Ltd. (Japan) )

Miyoshi, S. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

掲載資料名:

Metrology, Inspection, and Process Control for Microlithography XVI

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4689

発行年:

2002

巻:

Part Two

開始ページ:

904

終了ページ:

910

総ページ数:

7

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444356 [0819444359]

言語:

英語

請求記号:

P63600/4689

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012522
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Metrology, inspection, and process control for microlithography
回次:	2002 : 16th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2002.03.04-2002.03.07

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1 国際会議録 Defect analysis in 157-nm photolithography process Hori, S., Miyahara, O., Kiba, Y., Ono, Y., Kitano, J., Miyoshi, S., Furukawa, T., Itani, T. SPIE-The International Society for Optical Engineering	7 国際会議録 157-nm lithography with high numerical aperture lens for 70-nm technology node Suganaga, T., Kanda, N., Kim, J.-H., Yamabe, O., Watanabe, K., Furukawa, T., Miyoshi, S., Itani, T., Cashmore, J.S., … SPIE-The International Society for Optical Engineering
2 国際会議録 Pattern transfer processes for 157-nm lithography Miyoshi, S., Furukawa, T., Watanabe, H., Irie, S., Itani, T. SPIE-The International Society for Optical Engineering	8 国際会議録 157-nm chromeless phase lithography for 45-nm SRAM gate Suganaga, T., Watanabe, K., Matsuura, S., Hagiwara, T., Furukawa, T., Itani, T., Fujii, K. SPIE - The International Society of Optical Engineering
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