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Characterization and reduction of highly localized substrate contamination defects in metal patterning

著者名:
Gu, Y. ( Integrated Device Technology, Inc. (USA) )
Zhang, A.
Yu, Z.
Cao, W.
Chen, S.
Sturtevant, J.L.
Lee, S.K.
さらに 2 件
掲載資料名:
Metrology, Inspection, and Process Control for Microlithography XVI
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
4689
発行年:
2002
巻:
Part Two
開始ページ:
636
終了ページ:
645
総ページ数:
10
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444356 [0819444359]
言語:
英語
請求記号:
P63600/4689
資料種別:
国際会議録

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