Application of intentional defect arrays for assessing wafer inspection tool capabilities

Application of intentional defect arrays for assessing wafer inspection tool capabilities

著者名:

Warrick, A.L. ( International SEMATECH (USA) )
Engbrecht, A. ( International SEMATECH (USA) )
Jarvis, R.J.

掲載資料名:

Metrology, Inspection, and Process Control for Microlithography XVI

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4689

発行年:

2002

巻:

Part One

開始ページ:

549

終了ページ:

557

総ページ数:

9

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444356 [0819444359]

言語:

英語

請求記号:

P63600/4689

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012521
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Metrology, inspection, and process control for microlithography
回次:	2002 : 16th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2002.03.04-2002.03.07

類似資料:

1 国際会議録 Use of intentional-defect wafers for tool inspection validation Jarvis,R.W., Chua,C. SPIE - The International Society for Optical Engineering	7 国際会議録 Scanning array lens lithography for large-area applications Wang,L.C., Markle,D.A., Ellis,R.J. SPIE-The International Society for Optical Engineering
2 国際会議録 Using optical pattern filtering defect inspection tools and process-induced defects per wafer pass for process defect control Alvis,J.R., Satterfield,M.J., Gabella,P. SPIE-The International Society for Optical Engineering	8 国際会議録 Intentional defect array wafers: their practical use in semiconductor control and monitoring systems Emami, I., McIntyre, M., Retersdorf, M. SPIE-The International Society for Optical Engineering
3 国際会議録 Wafer plane inspection for advanced reticle defects R. Nagpal, F. Ghadiali, J. Kim, T. Huang, S. Pang Society of Photo-optical Instrumentation Engineers	9 国際会議録 Model of Wafer Thickness Uniformity in an Electroplating Tool Deligianni, H., Dukovic, J.O., Walton, E.G., Contolini, R.J., Reid, J., Patton, E. Electrochemical Society
4 国際会議録 Pulsed thermographic inspection and application in commercial aircraft repair Ducar,R.J. SPIE - The International Society for Optical Engineering	10 国際会議録 Surface Acoustic Wave Chemical Microsensors and Sensor Arrays for Industrial Process Control and Pollution Prevention Wohltjen, H., Jarvis, N. L., Lint, J. R. American Chemical Society
5 国際会議録 Size matters:defect detectability in reticle and wafer inspection including advanced aerial image simulation for defect printability Almog,E., Caldwell,R.F., Chang,F.-C., Chen,J.F., Farrar,N.R., Karklin,L., Laidig,T.L., Sabouri,S., Shen,W.P., Staud,W., … SPIE - The International Society for Optical Engineering	11 国際会議録 Product and tool control using integrated auto-macro defect inspection in the photolithography cluster [6152-65] Menon, V. C., Isaacson, R. L., Nicholls, M. C., Lickteig, S. J., Forstner, T., Barnett, A. R., Mulhall, J. SPIE - The International Society of Optical Engineering
6 国際会議録 Detailed characterization of inspection tools: capabilities and limitations of the KLA 576 [5992-192] Heumann, J., Moses, R., Holfeld, C., Schmidt, N., Aquino, C. SPIE - The International Society of Optical Engineering	12 国際会議録 Qualification of alternating PSM: defect inspection analysis in comparison to wafer printing results Dettmann, W., Heumann, J.P., Hagner, T., Koehle, R., Rahn, S., Verbeek, M., Zarrabian, M., Weckesser, J., Hennig, M., … SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12