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Structural characterizaton of deep-submicron lithographic structures using small-angle nentron scattering

著者名:
Lin, E.K. ( National Institute of Standards and Technology (USA) )
Jones, R.L.
Wu, W.-L.
Barker, J.G.
Bolton, P.J. ( Shipley Co. Inc. (USA) )
Barclay, G.G.
さらに 1 件
掲載資料名:
Metrology, Inspection, and Process Control for Microlithography XVI
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
4689
発行年:
2002
巻:
Part One
開始ページ:
541
終了ページ:
548
総ページ数:
8
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444356 [0819444359]
言語:
英語
請求記号:
P63600/4689
資料種別:
国際会議録

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