Advances in process overlay: ATHENA alignment system performance on critical process layers

Advances in process overlay: ATHENA alignment system performance on critical process layers

著者名:

Laidler, D. ( IMEC (Belgium) )
Megens, H.J. ( ASML (Netherlands) )
Lalbahadoersing, S.
van Haren, R.J.
Bornebroek, F.

掲載資料名:

Metrology, Inspection, and Process Control for Microlithography XVI

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4689

発行年:

2002

巻:

Part One

開始ページ:

397

終了ページ:

408

総ページ数:

12

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444356 [0819444359]

言語:

英語

請求記号:

P63600/4689

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012521
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Metrology, inspection, and process control for microlithography
回次:	2002 : 16th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2002.03.04-2002.03.07

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1 国際会議録 Advances in process overlay Hinnen,P.C., Megens,H.J.L., Schaar,M.van der, Haren,R.J.F.van, Mos,E.C., Lalbahadoersing,S., Bornebroek,F., Laidler,D. SPIE-The International Society for Optical Engineering	7 国際会議録 Advances in process overlay on 300-mm wafers Staecker, J., Arendt, S., Schumacher, K., Mos, E.C., van Haren, R.J., van der Schaar, M., Edart, R., Demmerie, W., … SPIE-The International Society for Optical Engineering
2 国際会議録 Advances in process overlay: alignment solutions for future technology nodes H. Megens, R. van Haren, S. Musa, M. Doytcheva, S. Lalbahadoersing, M. van Kemenade, H. Lee, P. Hinnen, F. van Bilsen SPIE - The International Society of Optical Engineering	8 国際会議録 Comparison of ATHENA and TTL alignment capability in product wafers Opitz, J., Laidler, D. SPIE-The International Society for Optical Engineering
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4 国際会議録 Overlay performance in advanced processes Bornebroek,F., Burghoorn,J., Greeneich,J.S., Megens,H.J., Satriasaputra,D., Simons,G., Stalnaker,S., Koek,B. SPIE - The International Society for Optical Engineering	10 国際会議録 Extended ATHENA alignment performance and application for the 100-nm technology node Navarro,R., Keij,S., Boef,A.J.den, Schets,S., Bilsen,F.van, Simons,G., Schuurhuis,R., Burghoorn,J. SPIE-The International Society for Optical Engineering
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6 国際会議録 Improved wafer stepper alignment performance using an enhanced phase grating alignment system Jaap H. M. Neijzen, Robert D. Morton, Peter Dirksen, Henry J. L. Megens, Frank Bornebroek SPIE - The International Society of Optical Engineering	12 国際会議録 W-CMP alignment using ASML's ATHENA system on an I-line stepper Prasad,K.J., Rajan,D.A., Tan,Y.K., Sun,G.P., Morgan,S., Phillips,M., Ng,B. SPIE-The International Society for Optical Engineering

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