CD reference materials for sub-10th μm applications
- 著者名:
Cresswell, M.W. ( National Institute of Standards and Technology (USA) ) Bogardus, E.H. ( International SEMATECH (USA) ) de Pinillos, J.V.M. ( National Institute of Standards and Technology (USA) ) Bennett, M.H. ( International SEMATECH (USA) ) Allen, R.A. ( National Institute of Standards and Technology (USA) ) Guthrie, W.F. Murabito, C.E. am Ende, B.A. Linholm, L.W. - 掲載資料名:
- Metrology, Inspection, and Process Control for Microlithography XVI
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4689
- 発行年:
- 2002
- 巻:
- Part One
- 開始ページ:
- 116
- 終了ページ:
- 127
- 総ページ数:
- 12
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444356 [0819444359]
- 言語:
- 英語
- 請求記号:
- P63600/4689
- 資料種別:
- 国際会議録
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11
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