Large-field ion optics for projection and proximity printing and for maskless lithography (MLZ)
- 著者名:
Loeschner, H. ( Ionen Mikrofabrikations System GmbH (Austria) ) Stengl, G. Buschbeck, H. Chalupka, A. Lammer, G. Platzgummer, E. Vonach, H. de Jager, P.W.H. ( TNO Institute of Applied Physics (Netherlands) ) Kaesmaier, R. ( Infineon Technologies AG (Germany) ) Ehrmann, A. Hirscher, S. Wolter, A. Dietzel, A. ( IBM Storage Technology Div. (Germany) ) Berger, R. Grimm, H. Terris, B.D. ( IBM Almaden Research Ctr. (USA) ) Bruenger, W.H. ( Fraunhofer Institute for Silicon Technology (Germany) ) Adam, D. ( Leica Microsystems Lithography GmbH (Germany) ) Boehm, M. Eichhorn, H. Springer, R. ( Institut fuer Mikroelektronik Stuttgart (Germany) ) Butschke, J. Letzkus, F. Ruchhoeft, P. ( Univ. of Houston (USA) ) Wolfe, J.C. - 掲載資料名:
- Emerging Lithographic Technologies VI
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4688
- 発行年:
- 2002
- 巻:
- Part Two
- 開始ページ:
- 595
- 終了ページ:
- 606
- 総ページ数:
- 12
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444349 [0819444340]
- 言語:
- 英語
- 請求記号:
- P63600/4688
- 資料種別:
- 国際会議録
類似資料:
Materials Research Society |
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
Materials Research Society |
SPIE-The International Society for Optical Engineering |
Materials Research Society |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
11
国際会議録
Projection maskless lithography (PML2): proof-of-concept setup and first experimental results
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |