Status of fabrication of square-format masks for extreme-ultraviolet lithography (EUVL) at the MCoC

Status of fabrication of square-format masks for extreme-ultraviolet lithography (EUVL) at the MCoC

著者名:

Racette, K.C. ( IBM Microelectronics Div. (USA) )

掲載資料名:

Emerging Lithographic Technologies VI

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4688

発行年:

2002

巻:

Part One

開始ページ:

161

終了ページ:

172

総ページ数:

12

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444349 [0819444340]

言語:

英語

請求記号:

P63600/4688

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012519
シリーズID:	PA00000029
会議名:	Emerging lithographic technologies
回次:	2002 : 6th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2002.03.05-2002.03.07

類似資料:

1 国際会議録 Process for improved reflectivity uniformity in extreme-ultraviolet lithography (EUVL) masks Thiel, C., Racette, K.C., Fisch, E., Lawliss, M., Kindt, L., Huang, C., Ackel, R., Levy, M. SPIE-The International Society for Optical Engineering	7 国際会議録 Next-generation lithography mask development at the NGL-MCOC Lercel,M.J., Racette,K.C., Magg,C., Lawliss,M., Collins,K.W., Barrett,M., Trybendis,M.J., Bouchard,L. SPIE - The International Society for Optical Engineering
2 国際会議録 EUVL mask fabrication for the 45-nm node Fisch, E., Kindt, L., Lercel, M.J., Racette, K.C., Williams, C.T. SPIE-The International Society for Optical Engineering	8 国際会議録 Next-generation lithography mask development at the NGL Mask Center of Competency Lercel,M.J., Brooks,C.J., Racette,K.C., Magg,C., Lawliss,M., Caldwell,N., Jeffer,R., Collins,K.W., Barrett,M., … SPIE - The International Society for Optical Engineering
3 国際会議録 Mask availability for next-generation lithography Lercel, M.J., Fisch, E., Racette, K.C., Lawliss, M., Williams, C. T., Kindt, L., Huang, C. SPIE-The International Society for Optical Engineering	9 国際会議録 Advanced refractory-metal and process technology for the fabrication of x-ray masks Brooks,C.J., Racette,K.C., Lercel,M.J., Powers,L.A., Benoit,D.E. SPIE - The International Society for Optical Engineering
4 国際会議録 EPL mask fabrication Lercel, M.J., Williams, C.T., Lawliss, M., Ackel, R., Kindt, L., Fisch, E. SPIE-The International Society for Optical Engineering	10 国際会議録 Characterization of binary and attenuated phase shift mask blanks for 32nm mask fabrication T. Faure, E. Gallagher, M. Hibbs, L. Kindt, K. Racette Society of Photo-optical Instrumentation Engineers
5 国際会議録 Evaluation and comparison of the pattern transfer-induced image placement distortions on e-beam projection lithography masks Magg,C., Lercel,M.J., Lawliss,M., Ackel,R., Caldwell,N., Kindt,L., Racette,K.C., Williams,C., Reu,P.L. SPIE-The International Society for Optical Engineering	11 国際会議録 Low-defect EUVI multilayers on standard-format mask blanks Folta, J.A., Kearney, P.A., Larson, C.C., Crosley, M.K., Fisch, E., Racette, K.C. SPIE-The International Society for Optical Engineering
6 国際会議録 Characterization and etching of sputter-deposited absorber films for extreme ultraviolet lithography (EUVL) masks Racette,K.C., Williams,C.T., Lercel,M.J. SPIE-The International Society for Optical Engineering	12 国際会議録 Evaluation of an advanced chemically amplified resist for next-generation lithography mask fabrication Magg,C., Lercel,M.J., Lawliss,M., Kwong,R.W., Huang,W.-S., Angelopoulos,M. SPIE-The International Society for Optical Engineering

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