High-power EUV sources for lithography: a comparison of laser-produced plasma and gas-discharge-produced plasma
- 著者名:
Stamm, U. ( XTREME technologies GmbH (Germany) ) Ahmad, I. Borisov, V.M. ( Troitsk Institute of Innovation and Fusion Research (Russia) ) Flohrer, F. ( XTREME technologies GmbH (Germany) ) Gaebel, K. Goetze, S. Ivanov, A.S. ( Troitsk Institute of Innovation and Fusion Research (Russia) ) Khristoforov, O,B. Kloepfel, D. ( XTREME technologies GmbH (Germany) ) Koehler, P. Kleinschmidt, J. Korobotchko, V. Ringling, J. Schriever, G. Vinokhodov, A.Y. ( Troitsk Institute of Innovation and Fusion Research(Russia) ) - 掲載資料名:
- Emerging Lithographic Technologies VI
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4688
- 発行年:
- 2002
- 巻:
- Part One
- 開始ページ:
- 122
- 終了ページ:
- 133
- 総ページ数:
- 12
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444349 [0819444340]
- 言語:
- 英語
- 請求記号:
- P63600/4688
- 資料種別:
- 国際会議録
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9
国際会議録
Extreme ultraviolet sources and measurement tools for EUV-lithography and system development
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |