New flexible origination technology based on electron-beam lithography and its intergration into security devices in combination with covert features based on DNA authentication

New flexible origination technology based on electron-beam lithography and its intergration into security devices in combination with covert features based on DNA authentication

著者名:

Drinkwater, J.K. ( Optaglio Ltd. (UK) )
Ryzi, Z. ( Optaglio sro (Czech Republic) )
Outwater, C.S. ( DNA Technologies, Inc. (USA) )

掲載資料名:

Optical Security and Counterfeit Deterrence Techniques IV

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4677

発行年:

2002

開始ページ:

203

終了ページ:

214

総ページ数:

12

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444172 [0819444170]

言語:

英語

請求記号:

P63600/4677

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012506
シリーズID:	PA00000029
会議名:	IS&T/SPIE Electronic Imaging : Optical security and counterfeit deterrence techniques
回次:	2002 : 4th
会議開催地:	San Jose, CA, USA
会議開催年:	2002.01.23-2002.01.25

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