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Submicron BCDMOS process with extended LDMOS safe-operating-area by optimizing body current

著者名:
Lee, S.K. ( Fairchild Korea Semiconductor Co. )
Choi, Y.C.
Lee, S.H.
Kwon, T.H.
Kim, C.J.
Kang, H.S.
Song, C.S.
さらに 2 件
掲載資料名:
Advances in microelectronic device technology : 7-9 November 2001, Nanjing, China
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
4600
発行年:
2001
開始ページ:
26
終了ページ:
33
総ページ数:
8
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819443397 [0819443395]
言語:
英語
請求記号:
P63600/4600
資料種別:
国際会議録

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