Microstructuring irradiated by 197- and 308-nm excimer lasers

Microstructuring irradiated by 197- and 308-nm excimer lasers

著者名:

Lou, Q. ( Shanghai Institute of Optics and Fine Mechanics (China) )
Zhang, L.

掲載資料名:

Photonic systems and applications : 27-30 November 2001, Singapore

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4595

発行年:

2001

開始ページ:

147

終了ページ:

150

総ページ数:

4

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819443250 [0819443255]

言語:

英語

請求記号:

P63600/4595

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012423
シリーズID:	PA00000029
会議名:	International Symposium on Photonics and Applications : Photonic systems and applications
回次:	2001
会議開催地:	Singapore
会議開催年:	2001.11.27-2001.11.30

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