Parameters study to improve sidewall roughness in advanced silicon etch process
- 著者名:
- Liu, H.-C. ( National Chiao Tung Univ. (Taiwan) )
- Lin, Y.-H. ( National Science council (Taiwan) )
- Chou, B.C.S.
- Hsu, Y.-Y.
- Hsu, W. ( National Chiao Tung Univ. (Taiwan) )
- 掲載資料名:
- Device and process technologies for MEMS and Microelectronics II : 17-19 December 2001, Adelaide, Australia
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4592
- 発行年:
- 2001
- 開始ページ:
- 503
- 終了ページ:
- 513
- 総ページ数:
- 11
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819443229 [0819443220]
- 言語:
- 英語
- 請求記号:
- P63600/4592
- 資料種別:
- 国際会議録
類似資料:
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
Electrochemical Society |
4
国際会議録
Process Parameter and Cutting-Tool Geometry Study for Precision Face Turning of a Clock Dial
Trans Tech Publications |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering | |
SPIE - The International Society of Optical Engineering |