One step forward to maturity of AF (assistant feature)-OPC in 100-nm level DRAM application
- 著者名:
Kang,H.-J. ( Samsung Electronics Co., Ltd. ) Kim,B.-S. Park,J.-S. Kim,I.-S. Yeo,G.-S. Lee,J.-H. Cho,H.-K. Moon,J.-T. - 掲載資料名:
- 21st Annual BACUS Symposium on Photomask Technology
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4562
- 発行年:
- 2001
- 巻:
- 4562
- パート:
- Two of Two Parts
- 開始ページ:
- 1096
- 終了ページ:
- 1103
- 総ページ数:
- 8
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819442901 [0819442909]
- 言語:
- 英語
- 請求記号:
- P63600/4562
- 資料種別:
- 国際会議録
類似資料:
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
5
国際会議録
Successful application of angular scatterometry to process control in sub-100-nm DRAM device
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
6
国際会議録
Improving model-based OPC performance for sub-60nm devices using real source optical model [6156-32]
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |