Evaluation of various alternating phase shifting mask processes for KrF lithography

Evaluation of various alternating phase shifting mask processes for KrF lithography

著者名:

Yoon,S.-Y. ( PKL )

掲載資料名:

21st Annual BACUS Symposium on Photomask Technology

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4562

発行年:

2001

巻:

4562

パート:

Two of Two Parts

開始ページ:

1017

終了ページ:

1025

総ページ数:

9

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819442901 [0819442909]

言語:

英語

請求記号:

P63600/4562

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012276
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
回次:	2001 : 21st
会議開催地:	Monterey, CA, USA
会議開催年:	2001.10.03-2001.10.05

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2 国際会議録 Dry etching characteristics of attenuated phase-shifting masks using Cl2/CF4/O2/He plasmas Choi,S.J., Cha,H.-S., Yoon,S.-Y., Jung,S.-M., Choi,S.-S., Jeong,S.-H. SPIE-The International Society for Optical Engineering	8 国際会議録 Effect of phase error on 180-nm and 250-nm grouped-line KrF lithography using an alternating phase-shift mask Petersen,J.S., Williams,A.M., Rich,G.K., Miller,D.A., Martinez,A.M.,Jr. SPIE-The International Society for Optical Engineering
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4 国際会議録 Etching selectivity and surface profile of attenuated phase-shifting mask using CF4/O2/He inductively coupled plasma (ICP) Yoon, S.-Y., Choi, S.-J., Kim, Y.-D., Lee, D.-H., Cha, H.-S., Kim, J.-M., Choi, S.-S., Jeong, S.H. SPIE-The International Society for Optical Engineering	10 国際会議録 Attainable road to the lower-k1 extension using high-transmittance attenuated phase-shifting mask in the KrF lithography world Kim, I.-S., Jung, S.-G., Kim, H.-D., Yeo, G.-S., Shin, I.-K., Lee, J.-H., Cho, H.-K., Moon, J.-T. SPIE-The International Society for Optical Engineering
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