Optimization of alternating phase shifting mask structure

Optimization of alternating phase shifting mask structure

著者名:

Cha,H.-S. ( PKL )

掲載資料名:

21st Annual BACUS Symposium on Photomask Technology

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4562

発行年:

2001

巻:

4562

パート:

Two of Two Parts

開始ページ:

1008

終了ページ:

1016

総ページ数:

9

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819442901 [0819442909]

言語:

英語

請求記号:

P63600/4562

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012276
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
回次:	2001 : 21st
会議開催地:	Monterey, CA, USA
会議開催年:	2001.10.03-2001.10.05

類似資料:

1 国際会議録 Evaluation of various alternating phase shifting mask processes for KrF lithography Yoon,S.-Y., Cha,H.-S., Choi,S.-J., Jung,S.-M., Choi,S.-S., Jeong,S.-H. SPIE-The International Society for Optical Engineering	7 国際会議録 Effect of mask reduction ratio in alternating phase-shift masks Shin,I.-G., Lee,S.-W., Kim,Y.-H., Choi,S.-W., Han,W.-S., Sohn,J.-M., Lim,T.-K. SPIE-The International Society for Optical Engineering
2 国際会議録 Dry etching characteristics of attenuated phase-shifting masks using Cl2/CF4/O2/He plasmas Choi,S.J., Cha,H.-S., Yoon,S.-Y., Jung,S.-M., Choi,S.-S., Jeong,S.-H. SPIE-The International Society for Optical Engineering	8 国際会議録 Investigation on micro-trench formation of alternating aperture phase shift masks Kwon, S.-W., Jeong, H.-S., Kim, L.-J., Ahn, C.-N., Kim, H.-S. SPIE-The International Society for Optical Engineering
3 国際会議録 Etching selectivity and surface profile of attenuated phase-shifting mask using CF4/O2/He inductively coupled plasma (ICP) Yoon, S.-Y., Choi, S.-J., Kim, Y.-D., Lee, D.-H., Cha, H.-S., Kim, J.-M., Choi, S.-S., Jeong, S.H. SPIE-The International Society for Optical Engineering	9 国際会議録 Doubly exposed patterning using mutually one-pitch step-shifted alternating phase-shift masks Lee,S.-W., Chung,D.-H., Shin,I.-G., Kim,Y.-H., Choi,S.-W., Han,W.-S., Sohn,J.-M. SPIE-The International Society for Optical Engineering
4 国際会議録 Doubly exposed patterning characteristics using two alternating phase-shift masks Lee,S.-W., Shin,I.-G., Kim,Y.-H., Choi,S.-W., Han,W.-S., Yoon,H.-S., Sohn,J.-M. SPIE-The International Society for Optical Engineering	10 国際会議録 Technological challenges in implementation of alternating phase-shift mask Tsai,W., Qian,Q., Buckmann,K.M., Cheng,W.-H., He,L., Irvine,B., Kamna,M., Korobko,Y., Kovalchick,M., Labovitz,S.M., … SPIE-The International Society for Optical Engineering
5 国際会議録 Highly anisotropic etching of phase-shift masks using ICP of CF4-SF6-CHF3 gas mixtures Choi, S.-J., Cha, H.-S., Yoon, S.-Y., Kim, Y.-D., Lee, D.-H., Kim, J.-M., Kim, J.-S., Min, D.-S., Jang, P.-J., Chang, … SPIE-The International Society for Optical Engineering	11 国際会議録 Feasibility evaluations of alternating phase-shift mask for imaging sub-80nm feature with KrF Kang, M.-A., Kim, S.-H., Shin, I.-K., Choi, S.-W., Sohn, J.-M. SPIE-The International Society for Optical Engineering
6 国際会議録 Analytical approach to X-phenomenon in alternating phase-shifting masks Park, J.R., Kim, S.-H., Lee, H.-J., Jang, I.-Y., Choi, Y.-H., Yang, S.-H., Lee, Y.-H., Kim, Y.-H., Choi, S.-W., Yoon, … SPIE-The International Society for Optical Engineering	12 国際会議録 Defect dispositiong using mask printability analysis on alternating phase-shifting masks Chang, C.-H., Hsieh, C.-H., Tzu, S.-D., Dai, C.-M., Lin, B. J., Pang, L., Qian, Q.-D., Chen, J.-H., Huang, J. H. SPIE-The International Society for Optical Engineering

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