Characterization and etching of sputter-deposited absorber films for extreme ultraviolet lithography (EUVL) masks
- 著者名:
- Racette,K.C. ( Photronics, Inc. )
- Williams,C.T.
- Lercel,M.J.
- 掲載資料名:
- 21st Annual BACUS Symposium on Photomask Technology
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4562
- 発行年:
- 2001
- 巻:
- 4562
- パート:
- Two of Two Parts
- 開始ページ:
- 883
- 終了ページ:
- 892
- 総ページ数:
- 10
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819442901 [0819442909]
- 言語:
- 英語
- 請求記号:
- P63600/4562
- 資料種別:
- 国際会議録
類似資料:
1
国際会議録
Status of fabrication of square-format masks for extreme-ultraviolet lithography (EUVL) at the MCoC
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4
国際会議録
Process for improved reflectivity uniformity in extreme-ultraviolet lithography (EUVL) masks
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