Performance optimization of the double-exposure slternating PSM for (sub-) 100-nm ICs
- 著者名:
Vandenberghe,G.N. ( IMEC ) Driessen,F. Adrichem,P.J.van Ronse,K. Li,J. Karklin,L. - 掲載資料名:
- 21st Annual BACUS Symposium on Photomask Technology
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4562
- 発行年:
- 2001
- 巻:
- 4562
- パート:
- One of Two Parts
- 開始ページ:
- 394
- 終了ページ:
- 405
- 総ページ数:
- 12
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819442901 [0819442909]
- 言語:
- 英語
- 請求記号:
- P63600/4562
- 資料種別:
- 国際会議録
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SPIE-The International Society for Optical Engineering |
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SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |