Performance data of a new 248-nm CD metrology tool proved on COG reticles and PSMs

Performance data of a new 248-nm CD metrology tool proved on COG reticles and PSMs

著者名:

Schlueter,G. ( Leica Microsystems GmbH )
Steinberg,W.
Whittey,J.

掲載資料名:

21st Annual BACUS Symposium on Photomask Technology

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4562

発行年:

2001

巻:

4562

パート:

One of Two Parts

開始ページ:

379

終了ページ:

385

総ページ数:

7

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819442901 [0819442909]

言語:

英語

請求記号:

P63600/4562

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012276
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
回次:	2001 : 21st
会議開催地:	Monterey, CA, USA
会議開催年:	2001.10.03-2001.10.05

類似資料:

1 国際会議録 First performance data obtained on next-generation mask metrology tool Schlueter,G., Roeth,K.-D., Whittey,J. SPIE-The International Society for Optical Engineering	7 国際会議録 Actual performance data obtained on new transmitted light mask metrology system Roeth, K.-D., Schlueter, G. SPIE-The International Society for Optical Engineering
2 国際会議録 Reticle CD-SEM for 65-nm technology node and beyond Schlueter, G. W. B., Nakamura, T., Matsumoto, J., Seyama, M., Whittey, J. M. SPIE - The International Society of Optical Engineering	8 国際会議録 LWM 200 CD metrology tool evaluation Uitz,R., Whittey,J.M. SPIE - The International Society for Optical Engineering
3 国際会議録 Measurement results on after-etch resist coated features on the new Leica Microsystems' LWM270 DUV critical dimension metrology system Whittey, J. M., Steinberg, W. SPIE - The International Society of Optical Engineering	9 国際会議録 Actual measurement data obtained on new 65nm generation mask metrology toot set Bender, J., Ferber, M., Roth, K.-D., Schluter, G., Steinberg, W., Scheuring, G., Hillmann, F. SPIE - The International Society of Optical Engineering
4 国際会議録 Implementation of 248-nm based CD metrology for advanced reticle production Hourd, A.C., Grimshaw, A., Scheuring, G., Gittinger, C., Doebereiner, S., Hillmann, F., Brueck, H.-J., Hartmann, H., … SPIE-The International Society for Optical Engineering	10 国際会議録 Systematic investigation of CD metrology tool response to sidewall profile variation on a COG test mask [6281-16] Gans, F., Liebe, R., Heins, Th., Richter, J., Hasler-Grohne, W., Frase, G. C., Bodermann, B., Czerkas, S., Dirscherl, … SPIE - The International Society of Optical Engineering
5 国際会議録 Performance data obtained on a new mask metrology tool Roth,K.-D., Blasing-Bangert,C., Whittey,J.M. SPIE-The International Society for Optical Engineering	11 国際会議録 First results from a new 248-nm CD measurement system for future mask and reticle generation Schluter,G., Scheuring,G., Helbing,J., Lehnigk,S., Bruck,H.-J. SPIE-The International Society for Optical Engineering
6 国際会議録 New UV-capable photomask CD metrology tool Schlueter, G., Brueck, H. -J., Birkenmayer, S., Falk, G., Scheuring, G., Walden, L., Lehnigk, S. SPIE - The International Society of Optical Engineering	12 国際会議録 First performance data obtained on next-generation optical mask metrology tools Roeth,K.-D., Blaesing,C., Alt,H., Schlueter,G. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12