Blank Cover Image

2001 update on the SEMI Standards Mask Qualification Terminology Task Force

著者名:
Jonckheere,R.M. ( IMEC )  
掲載資料名:
21st Annual BACUS Symposium on Photomask Technology
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
4562
発行年:
2001
巻:
4562
パート:
One of Two Parts
開始ページ:
264
終了ページ:
271
総ページ数:
8
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819442901 [0819442909]
言語:
英語
請求記号:
P63600/4562
資料種別:
国際会議録

類似資料:

1 国際会議録 2002 update on the SEMI Standards Mask Qualification Terminology Task Force (Invited Paper)

Jonckheere, R.M.

SPIE-The International Society for Optical Engineering
7 国際会議録 Printability of 2D mask quality

Philipsen, V., Jonckheere, R.

SPIE - The International Society of Optical Engineering
2 国際会議録 January 2004 update on the SEMI standards task force on photomask qualification terminology

Jonckheere, R. M.

SPIE - The International Society of Optical Engineering
8 国際会議録 Determining the transfer function of a mask fabrication process

Leunissen, P. L. H. A., Philipsen, V., Jonckheere, R. M.

SPIE - The International Society of Optical Engineering
3 国際会議録 Printability study for phase-shift masks at 193-nm lithography

Philipsen, V., Jonckheere, R.M.

SPIE-The International Society for Optical Engineering
9 国際会議録 Defect printability for 100-nm design rule using 193-nm lithography

Philipsen, V., Jonckheere, R.M., Kohlpoth, S., Torres, A.

SPIE-The International Society for Optical Engineering
4 国際会議録 Feature proximity errors on mask: assessment results of commercially obtained reticles

Jonckheere, R.M., Potoms, G., Philipsen, V.

SPIE-The International Society for Optical Engineering
10 国際会議録 (172e) Update From the CACHE Fuel Cell Task Force

Jason M. Keith, Michael D. Gross, H. Scott Fogler, Donald J. Chmielewski

American Institute of Chemical Engineers
5 国際会議録 Extended defect printability study for 100-nm design rule using 193-nm lithography

Philipsen, V., Jonckheere, R.M.

SPIE-The International Society for Optical Engineering
11 国際会議録 Mask inspection challenges for 90- and 130-nm device technology nodes: inspection sensitivity and printability study using SEMI standard programmed defect masks

Kim, W.D., Akima, S., Aquino, C.M., Becker, C., Eickhotf, M.D., Narita, T., Quah, S.-K., Rohr, P.M., Schlaffer, R., …

SPIE-The International Society for Optical Engineering
6 国際会議録 OPC aware mask and wafer metrology

Maurer, W., Wiaux, V., Jonckheere, R.M., Philipsen, V., Hoffmann, T., Verhaegen, S., Ronse, K.G., England, J.G., Howard, …

SPIE-The International Society for Optical Engineering
12 国際会議録 Investigation of mask defectivity in full field EUV lithography

R. Jonckheere, F. Iwamoto, G. F. Lorusso, A. M. Goethals, K. Ronse

Society of Photo-optical Instrumentation Engineers
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12