Upgrades to the NIST/DARPA EUV reflectometry facility
- 著者名:
Tarrio,C. ( National Institute of Standards and Technology ) Lucatorto,T.B. Grantham,S. Squires,M.B. Arp,U. Deng,L. - 掲載資料名:
- Soft X-ray and EUV imaging systems II : 31 July-1 August 2001, San Diego, USA
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4506
- 発行年:
- 2001
- 開始ページ:
- 32
- 終了ページ:
- 38
- 総ページ数:
- 7
- 出版情報:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819442208 [0819442208]
- 言語:
- 英語
- 請求記号:
- P63600/4506
- 資料種別:
- 国際会議録
類似資料:
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
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SPIE - The International Society for Optical Engineering |
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9
国際会議録
Scaling studies of capping layer oxidation by water exposure with EUV radiation and electrons
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
MRS - Materials Research Society |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |