Defect printability study with programmed defects on halftone reticles
- 著者名:
Dettmann,W. ( Infineon Technologies AG ) Haffner,H. Heumann,J.P. Liebe,R. Ludwig,R. Moses,R. - 掲載資料名:
- Photomask and Next-Generation Lithography Mask Technology VIII
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4409
- 発行年:
- 2001
- 開始ページ:
- 479
- 終了ページ:
- 487
- 総ページ数:
- 9
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819441119 [0819441112]
- 言語:
- 英語
- 請求記号:
- P63600/4409
- 資料種別:
- 国際会議録
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5
国際会議録
Qualification of alternating PSM: defect inspection analysis in comparison to wafer printing results
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