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Quantitative analysis of mask error effect on wafer CD variation in ArF lithography

著者名:
Kim,S.-J. ( Hynix Semiconductor Inc. )
Koo,S.-S.
Kim,S.-M.
Ahn,C.-N.
Ham,Y.-M.
Shin,K.-S.
さらに 1 件
掲載資料名:
Photomask and Next-Generation Lithography Mask Technology VIII
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
4409
発行年:
2001
開始ページ:
101
終了ページ:
107
総ページ数:
7
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819441119 [0819441112]
言語:
英語
請求記号:
P63600/4409
資料種別:
国際会議録

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