Prediction of MEEF using a simple model and MEEF enhancement parameters
- 著者名:
Chung,D.-H. ( Samsung Electronics Co., Ltd. ) Yang,S.-H. Kim,H.-D. Shin,I.-G. Kim,Y.-H. Choi,S.-W. Han,W.-S. Sohn,J.-M. - 掲載資料名:
- Photomask and Next-Generation Lithography Mask Technology VIII
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4409
- 発行年:
- 2001
- 開始ページ:
- 94
- 終了ページ:
- 100
- 総ページ数:
- 7
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819441119 [0819441112]
- 言語:
- 英語
- 請求記号:
- P63600/4409
- 資料種別:
- 国際会議録
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