Impact of ArF attenuated PSM using multishifter layer (TiN/Si3N4) for next-generation lithography
- 著者名:
Nam,K.-H. ( DuPont Photomasks Korea Ltd. ) Kim,L.-J. Jeong,H.-S. Lee,S.-W. Lee,I.-S. Shin,C. Kim,H.-S. Dieu,L. Paek,S.W. Koo,S.-S. Bae,S.-M. Ham,Y.-M. Shin,K.-S. - 掲載資料名:
- Photomask and Next-Generation Lithography Mask Technology VIII
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4409
- 発行年:
- 2001
- 開始ページ:
- 70
- 終了ページ:
- 80
- 総ページ数:
- 11
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819441119 [0819441112]
- 言語:
- 英語
- 請求記号:
- P63600/4409
- 資料種別:
- 国際会議録
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