(Sub-) 100-nm gate patterning using 248-nm alternating PSM

(Sub-) 100-nm gate patterning using 248-nm alternating PSM

著者名:

掲載資料名:

Photomask and Next-Generation Lithography Mask Technology VIII

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4409

発行年:

2001

開始ページ:

61

終了ページ:

69

総ページ数:

9

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819441119 [0819441112]

言語:

英語

請求記号:

P63600/4409

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012125
シリーズID:	PA00000029
会議名:	Photomask and next-generation lithography mask technology
回次:	2001 : 8th
会議開催地:	Yokohama, Japan
会議開催年:	2001.04.25-2001.04.27

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