Recent advances in endpoint and in-line monitoring techniques for chemical-mechanical polishing processes

Recent advances in endpoint and in-line monitoring techniques for chemical-mechanical polishing processes

著者名:

Stein,D.J. ( Sandia National Labs. )
Hetherington,D.L.

掲載資料名:

In-line characterization, yield, reliability, and failure analysis in microelectronic manufacturing II : 31 May-1 June 2001, Edinburgh, UK

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4406

発行年:

2001

開始ページ:

157

終了ページ:

170

総ページ数:

14

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819441072 [0819441074]

言語:

英語

請求記号:

P63600/4406

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012122
シリーズID:	PA00000029
会議名:	Microelectronic Manufacturing Technologies : In-Line Characterization, Yield, Reliability, and Failure Analysis in Microelectronic Manufacturing
回次:	2001 : 2nd
会議開催地:	Edinburgh, UK
会議開催年:	2001.05.31-2001.06.01

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2 国際会議録 Prediction of tungsten CMP pad life using blanket removal rate data and endpoint data obtained from process temperature and carrier motor current measurements Stein,D.J., Hetherington,D.L. SPIE - The International Society for Optical Engineering	8 国際会議録 Recent advances with WYFFOS King,D.L., Worswick,S.P. SPIE-The International Society for Optical Engineering
3 国際会議録 Analysis of in-situ vibration monitoring for end-point detection of CMP planarization processes Hetherington,D.L., Stein,D.J., Lauffer,J.P., Wyckoff,E.E., Shingledecker,D.M. SPIE - The International Society for Optical Engineering	9 国際会議録 Validation of On-Line Monitoring Techniques for the Detection of Drift in Process Sensors Riner, J. L., Hashemian, H. M., Stansberry, D. V., Mitchell, D. W. American Institute of Chemical Engineers
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5 国際会議録 Improved polysilicon surface-micromachined micromirror devices using chemical-mechanical polishing Hetherington, Dale L., Sniegowski, Jeffry J. SPIE	11 国際会議録 Review and Experimental Analysis of Oxide CMP Models Stein, David J., Hetherington, Dale L. Electrochemical Society
6 国際会議録 The Chemical-Mechanical Polishing of Copper with Model Slurries Lee, B-C., Duquette, D.J., Gutmann, R.J. Electrochemical Society	12 国際会議録 Evaluation of pad life in chemical mechanical polishing process using statistical metrology Muthukrishnan,N.M., Prasad,S., Stine,B.E., Loh,W., Nagahara,R., Chung,J.E., Boning,D.S. SPIE-The International Society for Optical Engineering

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