Integrated metrology: an enabler for advanced process control (APC)

Integrated metrology: an enabler for advanced process control (APC)

著者名:

Schneider,C. ( Fraunhofer Institute for Integrated Circuits )
Pfitzner,L.
Ryssel,H.

掲載資料名:

In-line characterization, yield, reliability, and failure analysis in microelectronic manufacturing II : 31 May-1 June 2001, Edinburgh, UK

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4406

発行年:

2001

開始ページ:

118

終了ページ:

130

総ページ数:

13

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819441072 [0819441074]

言語:

英語

請求記号:

P63600/4406

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012122
シリーズID:	PA00000029
会議名:	Microelectronic Manufacturing Technologies : In-Line Characterization, Yield, Reliability, and Failure Analysis in Microelectronic Manufacturing
回次:	2001 : 2nd
会議開催地:	Edinburgh, UK
会議開催年:	2001.05.31-2001.06.01

類似資料:

1 国際会議録 Advanced process control system for vertical furnaces Berger,R., Schneider,C., Lehnert,W., Pfitzner,L., Ryssel,H. SPIE-The International Society for Optical Engineering	7 国際会議録 Organic contamination on wafers surfaces: measurement techniques and deposition kinetics Buegler, J., Zielonka, G., Pfitzner, L., Ryssel, H., Schottler, M. Electrochemical Society
2 国際会議録 Application and cost analysis of scatterometry for integrated metrology Benesch,N., Schneider,C., Pfitzner,L., Ryssel,H. SPIE - The International Society for Optical Engineering	8 国際会議録 Process Optimization by Means of Integrated Monitoring Tools in the Semiconductor Industry L.H. Pfitzner, A. Nutsch, G. Roeder, M. Schellenberger Electrochemical Society
3 国際会議録 Equipment and wafer modeling of batch furnaces by neural networks Benesch,N., Schneider,C., Lehnert,W., Pfitzner,L., Ryssel,H. SPIE - The International Society for Optical Engineering	9 国際会議録 Trends in European R&D - Advanced Process Control Down to Atomic Scale for Micro- and Nanotechnologies L. Pfitzner, M. Schellenberger, R. Oechsner, G. Roeder, M. Pfeffer Electrochemical Society
4 国際会議録 Feed-forward control for a lithography/etch sequence Ochsner,R., Tschaftary,T., Sommer,S., Pfitzner,L., Ryssel,H., Gerath,H., Baier,C., Hafner,M. SPIE-The International Society for Optical Engineering	10 国際会議録 The APC (Advanced Process Control) procedure for process window and CDU improvement using DBMs J. Kim, T. Lee, A. Jung, G. Yoo, H. Yang Society of Photo-optical Instrumentation Engineers
5 国際会議録 In-tool process control for advanced patterning based on integrated metrology Mui, D.S.L., Sasano, H., Liu, W., Yamartino, J., Skumanich, A. SPIE - The International Society of Optical Engineering	11 国際会議録 Advanced process control for poly-Si gate etching using integrated CD metrology Kota, G.P., Luque, J., Vahedi, V., Khathuria, A., Dziura, T.G., Levy, A. SPIE-The International Society for Optical Engineering
6 国際会議録 Control of organic contamination in CMOS manufacturing Bugler,J., Frickinger,J., Zielonka,G., Pfitzner,L., Ryssel,H., Schottler,M. SPIE-The International Society for Optical Engineering	12 国際会議録 INVITED: INTEGRATED METROLOGY AND ADVANCED PROCESS CONTROL IN SEMICONDUCTOR MANUFACTURING Shanmugasundram, A.P., Sarfaty, M., Schwann, A., Paik, J. Electrochemical Society

1

2

3

4

5

6

7

8

9

10

11

12