Control of organic contamination in CMOS manufacturing

Control of organic contamination in CMOS manufacturing

著者名:

Bugler,J. ( Fraunhofer Institute for Integrated Circuits )

掲載資料名:

In-line characterization, yield, reliability, and failure analysis in microelectronic manufacturing II : 31 May-1 June 2001, Edinburgh, UK

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4406

発行年:

2001

開始ページ:

82

終了ページ:

91

総ページ数:

10

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819441072 [0819441074]

言語:

英語

請求記号:

P63600/4406

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012122
シリーズID:	PA00000029
会議名:	Microelectronic Manufacturing Technologies : In-Line Characterization, Yield, Reliability, and Failure Analysis in Microelectronic Manufacturing
回次:	2001 : 2nd
会議開催地:	Edinburgh, UK
会議開催年:	2001.05.31-2001.06.01

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