Blank Cover Image

Optical proximity strategies for desensitizing lens aberrations

著者名:
Petersen,J.S. ( Petersen Advanced Lithography, Inc. )  
掲載資料名:
Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
4404
発行年:
2001
開始ページ:
254
終了ページ:
265
総ページ数:
12
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819441058 [0819441058]
言語:
英語
請求記号:
P63600/4404
資料種別:
国際会議録

類似資料:

1 国際会議録 Aberration evaluation and tolerancing of 193-nm lithographic objective lenses

Smith,B.W., Webb,J.E., Petersen,J.S., Meute,J.

SPIE-The International Society for Optical Engineering
7 国際会議録 Axicon lens for high-resolution optical coherence tomogrphy over a long focus depth

Ding,Z., Ren, H., Zhao, Y., Nelson, J.S., Chen, Z.

SPIE-The International Society for Optical Engineering
2 国際会議録 Aberration correction and desensitization of an inverse triplet objective lens

Betensky, Ellis

SPIE
8 国際会議録 Design of liquid crystal lens for the compensation of spherical aberration in the Blu-ray optical pickup [5966-65]

Chung, S. -H., Kim, Y. -J., Chang, I. -C., Jeong, H. -S.

SPIE - The International Society of Optical Engineering
3 国際会議録 Analytical description of antiscattering and scattering bar assist features

Petersen,J.S.

SPIE - The International Society for Optical Engineering
9 国際会議録 Optimal lens assignment through measured aberrations

Seong,N., Kang,Y.S., Cho,H., Moon,J.

SPIE-The International Society for Optical Engineering
4 国際会議録 Wavefront aberration measurement in 157-nm high numerical aperture lens

Kim, J.-H., Suganaga, T., Watanabe, K., Kanda, N., Itani, T., Cashmore, J.S., Gower, M.C.

SPIE-The International Society for Optical Engineering
10 国際会議録 Lens aberration measurement and analysis using a novel pattern

Nam,B.H., Cho,B.H., Park,J.O., Kim,D.-S., Baek,S.J., Jeong,J.H., Nam,B.-S., Hwang,Y.J., Song,Y.J.

SPIE-The International Society for Optical Engineering
5 国際会議録 Correction of 157-nm lens based on phase ring aberration extraction method

Meute, J., Rich, G.K., Conley, W., Smith, B.W., Zavyalova, L.V., Cashmore, J.S., Ashworth, D., Webb, J.E., Rich, L.

SPIE - The International Society of Optical Engineering
11 国際会議録 Optical extension at the 193-nm wavelength

Zandbergen,P., McCallum,M., Amblard,G.R., Domke,W.-D., Smith,B .W., Zavyalova,L., Petersen,J.S.

SPIE - The International Society for Optical Engineering
6 国際会議録 Effects of off-axis illumination and scatterirng-bar optical proximity correction on the impact of lens aberration on 130-nm polygate mask:a simulation study

Nakagawa,K.H., Hollerbach,U., Chen,J.F.

SPIE - The International Society for Optical Engineering
12 国際会議録 Chromatic aberrations in lens design

Velzel,C.H.F., de Meijere,J.L.F

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12