High-resolution proximity printing by wave-optically designed complex transmission masks
- 著者名:
Buhling,S. ( LightTrans GmbH ) Wyrowski,F. Kley,E.-B. Nellissen,A.J.M. Wang,L. Dirkzwager,M. - 掲載資料名:
- Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4404
- 発行年:
- 2001
- 開始ページ:
- 221
- 終了ページ:
- 230
- 総ページ数:
- 10
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819441058 [0819441058]
- 言語:
- 英語
- 請求記号:
- P63600/4404
- 資料種別:
- 国際会議録
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4
国際会議録
Analog proximity-photolithography with mask aligners for the manufacturing of micro-optical elements
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