Front-end-of-line process development using 193-nm lithography
- 著者名:
Pollentier,I.K. ( IMEC ) Ercken,M. Eliat,A. Delvaux,C. Jaenen,P. Ronse,K. - 掲載資料名:
- Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4404
- 発行年:
- 2001
- 開始ページ:
- 56
- 終了ページ:
- 67
- 総ページ数:
- 12
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819441058 [0819441058]
- 言語:
- 英語
- 請求記号:
- P63600/4404
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society for Optical Engineering |
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SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
3
国際会議録
Effects of different processing conditions on line-edge roughness for 193-nm and 157-nm resists
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
11
国際会議録
Application of scatterometry for CD and profile metrology in 193-nm lithography process development
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |