Quality assessment of advanced photomasks using the Q-CAP cluster tool | 東京工業大学附属図書館文献データベース

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Quality assessment of advanced photomasks using the Q-CAP cluster tool

著者名:

Peter,K. ( aiss GmbH )

さらに 9 件

掲載資料名:

17th European Conference on Mask Technology for Integrated Circuits and Microcomponents

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4349

発行年:

2000

開始ページ:

117

終了ページ:

124

総ページ数:

8

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819440396 [0819440396]

言語:

英語

請求記号:

P63600/4349

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012065
シリーズID:	PA00000029
会議名:	European Mask and Lithography Conference : European Conference on Mask Technology for Integrated Circuits and Microcomponents
回次:	2000 : 17th
会議開催地:	Munich, Germany
会議開催年:	2000.11.13-2000.11.14

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1 国際会議録 Cluster tool solution for fabrication and qualification of advanced photomasks Schatz,T., Hartmann,H., Peter,K., Lalanne,F.P., Maurin,O., Baracchi,E., Miramond,C., Bruck,H.-J., Scheuring,G., … SPIE - The International Society for Optical Engineering	7 国際会議録 Through-pellicle-capable DUV-based CD metrology on reticles for wafer fab and R&D environment Jonckheere, R.M., Philipsen, V., Scheuring, G., Hillmann, F., Brueck, H.-J., Ordynskyy, V., Peter, K., Hourd, A.C., … SPIE-The International Society for Optical Engineering
2 国際会議録 Definition of new quality criteria and assessment means for masks at 150-nm design rules and beyond Baracchi,E., Bruck,H.-J., Engel,T., Eran,Y., Lalanne,F.P., Maurin,O., Ordynskyy,V., Schatz,T., Sommer,K. SPIE - The International Society for Optical Engineering	8 国際会議録 Major improvements in mask CD metrology:enhanced performance on attenuated phase-shift masks,corner rounding measurements,and improved measurement automation Schluter,G., Scheuring,G., Falk,G., Bruck,H.-J., Schatz,T., Lehnigk,S. SPIE - The International Society for Optical Engineering
3 国際会議録 Cluster tool for photomask inspection and qualification at 150-nm design rules and beyond Peter,K., Ordynskyy,V., Dolainsky,C., Hartmann,H., Bruck,H.-J. SPIE - The International Society for Optical Engineering	9 国際会議録 Results of a round robin measurement on a new CD mask standard Gans, F., Liebe, R., Richter, J., Schatz, Th., Hauffe, B., Hillmann, F., Dobereiner, S., Bruck, H.-J., Scheuring, G., … SPIE - The International Society of Optical Engineering
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