First results from a new 248-nm CD measurement system for future mask and reticle generation

First results from a new 248-nm CD measurement system for future mask and reticle generation

著者名:

Schluter,G. ( Leica Microsystems Wetzlar GmbH )
Scheuring,G.
Helbing,J.
Lehnigk,S.
Bruck,H.-J.

掲載資料名:

17th European Conference on Mask Technology for Integrated Circuits and Microcomponents

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4349

発行年:

2000

開始ページ:

73

終了ページ:

77

総ページ数:

5

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819440396 [0819440396]

言語:

英語

請求記号:

P63600/4349

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012065
シリーズID:	PA00000029
会議名:	European Mask and Lithography Conference : European Conference on Mask Technology for Integrated Circuits and Microcomponents
回次:	2000 : 17th
会議開催地:	Munich, Germany
会議開催年:	2000.11.13-2000.11.14

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