Doubly exposed patterning characteristics using two alternating phase-shift masks
- 著者名:
Lee,S.-W. ( Samsung Electronics Co., Ltd. ) Shin,I.-G. Kim,Y.-H. Choi,S.-W. Han,W.-S. Yoon,H.-S. Sohn,J.-M. - 掲載資料名:
- 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4349
- 発行年:
- 2000
- 開始ページ:
- 32
- 終了ページ:
- 36
- 総ページ数:
- 5
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819440396 [0819440396]
- 言語:
- 英語
- 請求記号:
- P63600/4349
- 資料種別:
- 国際会議録
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