Testing of optical components for microlithography at 193- and 157-nm

Testing of optical components for microlithography at 193- and 157-nm

著者名:

Mann,K.R. ( Laser-Lab. Gottingen e.V. )

掲載資料名:

Optical Microlithography XIV

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4346

発行年:

2001

巻:

4346

パート:

Two of Two Parts

開始ページ:

1340

終了ページ:

1348

総ページ数:

9

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819440327 [0819440329]

言語:

英語

請求記号:

P63600/4346

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012062
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical microlithography
回次:	2001 : 14th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2001.02.27-2001.03.02

類似資料:

1 国際会議録 Long-term test and characterization of optical components at 193 nm and 157 nm Vogler,K., Klaft,I., Schroder,T., Stamm,U., Mann,K.R., Apel,O., Gorling,C., Leinhos,U. SPIE-The International Society for Optical Engineering	7 国際会議録 Repetition rate dependence of two-photon absorption and self-trapped exciton luminescence in CaF2 at 193 nm Goerling, C., Leinhos, U., Mann, K.R. SPIE-The International Society for Optical Engineering
2 国際会議録 CHARISMA: a new way for angular-resolved scattering measurements Apel,O., Gorling,C., Leinhos,U., Mann,K.R., Schafer,B. SPIE-The International Society for Optical Engineering	8 国際会議録 Optical metrology in the VUV and EUV spectral range Mann, K.R., Kranzusch, S., Eckert, G., Goerling, C., Leinhos, U., Peth, C., Schaefer, B. SPIE-The International Society for Optical Engineering
3 国際会議録 Characterization of DUV and VUV optical components Mann, K.R., Eckert, G., Goerling, C., Leinhos, U., Schaefer, B. SPIE-The International Society for Optical Engineering	9 国際会議録 Al2O3 coatings for 193 nm:a nonlinearly absorbing material Apel,O., Mann,K.R. SPIE - The International Society for Optical Engineering
4 国際会議録 Characterizing absorption and total scattering losses on optical components for 193-nm wafer steppers Mann,K.R., Apel,O., Eva,E. SPIE - The International Society for Optical Engineering	10 国際会議録 Nonlinear absorption phenomena in oxide coatings for 193 nm Apel,O., Mann,K.R., Heber,J., Thielsch,R. SPIE - The International Society for Optical Engineering
5 国際会議録 Comparative studies of absorptance behavior and laser-induced fluorescene of alkaline-earth fluorides at 193 and 157 nm Goerling, Ch., Leinhos, U., Mann, K.R. SPIE-The International Society for Optical Engineering	11 国際会議録 Characterization of absorption losses in deep UV optical materials K. Mann, U. Leinhos, B. Schäfer SPIE - The International Society of Optical Engineering
6 国際会議録 Quadratic increase of nonlinear absorption in thin Al2O3 films at 193 nm Apel,O., Mann,K.R., Marowsky,G. SPIE-The International Society for Optical Engineering	12 国際会議録 Stability of optical interference coatings exposed to low-fluence 193-nm ArF radiation Heber,J., Thielsch,R., Blaschke,H., Kaiser,N., Mann,K.R., Eva,E., Leinhos,U., Gortler,A. SPIE-The International Society for Optical Engineering

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