Advanced F2 lasers for 157-nm lithography

Advanced F2 lasers for 157-nm lithography

著者名:

Vogler,K. ( Lambda Physik GmbH )

掲載資料名:

Optical Microlithography XIV

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4346

発行年:

2001

巻:

4346

パート:

Two of Two Parts

開始ページ:

1175

終了ページ:

1182

総ページ数:

8

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819440327 [0819440329]

言語:

英語

請求記号:

P63600/4346

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012062
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical microlithography
回次:	2001 : 14th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2001.02.27-2001.03.02

類似資料:

1 国際会議録 High-power high-repetition-rate F2 lasers for 157-nm lithography Vogler, K., Klaft, I., Voss, F., Bragin, I., Bergmann, E., Nagy, T., Niemoeller, N., Spratte, S., Paetzel, R., Govorkov, … SPIE-The International Society for Optical Engineering	7 国際会議録 F2-laser systems prepared for advanced applications at 157 nm Delmdahl, R., Mannel, K., Spratte, S., Rebhan, U., Govorkov, S., Vogler, K., Bragin, I. SPIE - The International Society of Optical Engineering
2 国際会議録 High-power excimer lasers for 157-nm lithography Spratte, S., Voss, F., Bragin, I., Bergmann, E., Niemoeller, N., Nagy, T., Rebhan, U., Targsdorf, A., Paetzel, R., … SPIE-The International Society for Optical Engineering	8 国際会議録 High-repetition-rate excimer lasers for DUV Lithography Stamm,U., Paetzel,R., Bragin,I., Berger,V., Klaft,I., Kleinschmidt,J., Osmanov,R., Schroeder,T., Vogler,K., Zschocke,W., … SPIE - The International Society for Optical Engineering
3 国際会議録 Development and characterization of advanced F2 laser source for 157-nm lithography (Abstract Only) Vogler,K., Voss,F., Bergmann,E., Stamm,U., Govorkov,S.V., Hua,G., Walecki,W.J. SPIE-The International Society for Optical Engineering	9 国際会議録 High-repetition-rate excimer lasers for 193-nm lithography Zschocke, W., Albrecht, H.-S., Schroeder, T., Bragin, I., Lokai, P., Seddighi, F., Reusch, C., Cortona, A., Schmidt, K., … SPIE-The International Society for Optical Engineering
4 国際会議録 Advanced F2 lasers for microlithography Vogler,K., Stamm,U., Bragin,I., Voss,F., Govorkov,S.V., Hua,G., Kleinschmidt,J., Patzel,R. SPIE - The International Society for Optical Engineering	10 国際会議録 Reliable materials and instruments for 157-nm lithography (Abstract Only) Vogler,K., Voss,F., Bergmann,E., Stamm,U., Walecki,W.J., Basting,D. SPIE-The International Society for Optical Engineering
5 国際会議録 Excimer laser for 157-nm lithography Stamm,U., Bragin,I., Govorkov,S.V., Kleinschmidt,J., Patzel,R., Slobodtchikov,E., Vogler,K., F.Voｦﾂ, Basting,D. SPIE - The International Society for Optical Engineering	11 国際会議録 High-power 193-nm excimer lasers for DUV lithography Patzel,R., Vogler,K., Albrecht,H.S., Schroder,T., Bragin,I., Kleinschmidt,J., Zschocke,W. SPIE-The International Society for Optical Engineering
6 国際会議録 Sub-0.25-pm 50-W amplified excimer laser system for 193-nm lithography Govorkov, S.V., Wiessner, A.O., Hua, G., Misuryaev, T.V., Knysh, A.N., Spratte, S., Lokai, P., Nagy, T., Bragin, I., … SPIE - The International Society of Optical Engineering	12 国際会議録 Excimer lasers for superhigh NA 193-nm lithography Paetzel, R., Albrecht, H.S., Lokai, P., Zschocke, W., Schmidt, T., Bragin, I., Schroeder, T., Reusch, C., Spratte, S. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12