Comparison study on mask error factor in 100-nm ArF and KrF lithography
- 著者名:
- Eom,T.-S. ( Hyundai Electronics Industries Co., Ltd. )
- Hyun,Y.-S.
- Kim,C.-K.
- Bok,C.-K.
- Shin,K.-S.
- 掲載資料名:
- Optical Microlithography XIV
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4346
- 発行年:
- 2001
- 巻:
- 4346
- パート:
- Two of Two Parts
- 開始ページ:
- 869
- 終了ページ:
- 878
- 総ページ数:
- 10
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819440327 [0819440329]
- 言語:
- 英語
- 請求記号:
- P63600/4346
- 資料種別:
- 国際会議録
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9
国際会議録
Comparative study of chromeless and attenuated phase shift mask for 0.3-k1 ArF lithography of DRAM
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
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