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SCAA mask exposures and Phase Phirst designs for 100 nm and below

著者名:
掲載資料名:
Optical Microlithography XIV
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
4346
発行年:
2001
巻:
4346
パート:
One of Two Parts
開始ページ:
817
終了ページ:
826
総ページ数:
10
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819440327 [0819440329]
言語:
英語
請求記号:
P63600/4346
資料種別:
国際会議録

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