Doubly exposed patterning using mutually one-pitch step-shifted alternating phase-shift masks
- 著者名:
Lee,S.-W. ( Samsung Electronics Co., Ltd. ) Chung,D.-H. Shin,I.-G. Kim,Y.-H. Choi,S.-W. Han,W.-S. Sohn,J.-M. - 掲載資料名:
- Optical Microlithography XIV
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4346
- 発行年:
- 2001
- 巻:
- 4346
- パート:
- One of Two Parts
- 開始ページ:
- 762
- 終了ページ:
- 769
- 総ページ数:
- 8
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819440327 [0819440329]
- 言語:
- 英語
- 請求記号:
- P63600/4346
- 資料種別:
- 国際会議録
類似資料:
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
3
国際会議録
Feasibility evaluations of alternating phase-shift mask for imaging sub-80nm feature with KrF
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
6
国際会議録
Fidelity comparison of island patterns with different types of illuminations and phase shift masks
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |