UV cleaning of contaminated 157-nm reticles

UV cleaning of contaminated 157-nm reticles

著者名:

Bloomstein,T.M. ( MIT Lincoln Lab. )

掲載資料名:

Optical Microlithography XIV

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4346

発行年:

2001

巻:

4346

パート:

One of Two Parts

開始ページ:

669

終了ページ:

675

総ページ数:

7

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819440327 [0819440329]

言語:

英語

請求記号:

P63600/4346

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012062
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical microlithography
回次:	2001 : 14th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2001.02.27-2001.03.02

類似資料:

1 国際会議録 Laser cleaning of optical elements in 157-nm lithography Bloomstein,T.M., Rothschild,M., Liberman,V., Hardy,D.E., Efremow,N.N.,Jr., Palmacci,S.T. SPIE - The International Society for Optical Engineering	7 国際会議録 Controlled contamination of optics under 157-nm laser irradiation Bloomstein,T.M., Liberman,V., Palmacci,S.T., Rothschild,M. SPIE-The International Society for Optical Engineering
2 国際会議録 Contamination rates of optical surfaces at 157 nm in the presence of hydrocarbon impurities Bloomstein, T.M., Liberman, V., Rothschild, M., Palmacci, S.T., Hardy, D.E., Sedlacek, J.H.C. SPIE-The International Society for Optical Engineering	8 国際会議録 Photo-induced changes in 157-nm optical coatings Liberman, V., Bloomstein, T.M., Rothschild, M., Palmacci, S.T., Sedlacek, J.H.C., Grenville, A. SPIE - The International Society of Optical Engineering
3 国際会議録 Ambient effects on the laser durability of 157-nm optical coatings Liberman, V., Rothschild, M., Palmacci, S.T., Efremow, N.N., Jr., Sedlacek, J.H.C., Grenville, A. SPIE-The International Society for Optical Engineering	9 国際会議録 Optical materials and coatings at 157 nm Bloomstein,T.M., Liberman,V., Rothschild,M., Hardy,D.E., Goodman,R.B. SPIE - The International Society for Optical Engineering
4 国際会議録 Contamination rates of optical surfaces at 157 nm: impurities outgassed from construction materials and from photoresists Bloomstein, T.M., Sedlacek, J.H.C., Palmacci, S.T., Hardy, D.E., Liberman, V., Rothschild, M. SPIE-The International Society for Optical Engineering	10 国際会議録 Long-term laser durability testing of optical coatings and thin films for 157-nm lithography Liberman, V., Rorhschild, M., Palmacci, S.T., Efremow, N.N., Sedlacek, J.H.C., Grenville, A. SPIE-The International Society for Optical Engineering
5 国際会議録 Accelerated damage to blank and antireflectance-coated CaF2 surfaces under 157-nm laser irradiation Liberman, V., Rothschild, M., Palmacci, S.T., Efremow, N.N., Jr., Sedlacek, J.H.C., Grenville, A. SPIE-The International Society for Optical Engineering	11 国際会議録 Determination of optical properties of thin films and surfaces in 157-nm lithography Liberman,V., Bloomstein,T.M., Rothschild,M. SPIE - The International Society for Optical Engineering
6 国際会議録 Marathon evaluation of optical materials for 157-nm lithography Liberman,V., Rothschild,M., Efremow Jr.,N.N., Palmacci,S.T., Sedlacek,J.H.C., Peski,C.K.Van, Orvek,K.J. SPIE-The International Society for Optical Engineering	12 国際会議録 Angle-resolved scattering measurements of polished surfaces and optical coatings at 157 nm Bloomstein, T.M., Hardy, D.E., Gomez, L., Rothschild, M. SPIE-The International Society for Optical Engineering

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