ArF lithography options for 100-nm technologies

ArF lithography options for 100-nm technologies

著者名:

Vandenberghe,G.N. ( IMEC )

掲載資料名:

Optical Microlithography XIV

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4346

発行年:

2001

巻:

4346

パート:

One of Two Parts

開始ページ:

179

終了ページ:

190

総ページ数:

12

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819440327 [0819440329]

言語:

英語

請求記号:

P63600/4346

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012062
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical microlithography
回次:	2001 : 14th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2001.02.27-2001.03.02

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1 国際会議録 Status of ArF lithography for the 130-nm technology node Ronse,K., Vandenberghe,G., Jaenen,P., Delvaux,C., Vangoidsenhoven,D., Roey,F.Van, Pollers,I., Maenhoudt,M., … SPIE - The International Society for Optical Engineering	7 国際会議録 Front-end-of-line process development using 193-nm lithography Pollentier,I.K., Ercken,M., Eliat,A., Delvaux,C., Jaenen,P., Ronse,K. SPIE-The International Society for Optical Engineering
2 国際会議録 Challenge for sub-100-nm DRAM gate printing using ArF lithography with combination of moderate OAI and attPSM Kim,Y.-C., Vandenberghe,G.N., Verhaegen,S., Ronse,K. SPIE-The International Society for Optical Engineering	8 国際会議録 (Sub-) 100-nm gate patterning using 248-nm alternating PSM Vandenberghe,G.N., Jaenen,P., Jonckheere,R.M., Ronse,K., Toublan,O. SPIE-The International Society for Optical Engineering
3 国際会議録 Model-based OPC for first-generation 193-nm lithography Lucas,K.D., Word,J.C., Vandenberghe,G.N., Verhaegen,S., Jonckheere,R.M. SPIE-The International Society for Optical Engineering	9 国際会議録 High-NA ArF lithography for 70-nm technologies Montgomery, P.K., Vandenberghe, G., Lucas, K. SPIE-The International Society for Optical Engineering
4 国際会議録 Novel high-performance ArF resist for sub-100-nm lithography Lee,G., Koh,C.-W., Jung,J.-C., Jung,M.-H., Kong,K.-K., Kim,J.-S., Shin,K.-S., Choi,S.-J., Kim,Y.-S., Choi,Y.-J., … SPIE-The International Society for Optical Engineering	10 国際会議録 Performance optimization of the double-exposure slternating PSM for (sub-) 100-nm ICs Vandenberghe,G.N., Driessen,F., Adrichem,P.J.van, Ronse,K., Li,J., Karklin,L. SPIE-The International Society for Optical Engineering
5 国際会議録 Reticle quality needs for advanced 193-nm lithography Jonckheere,R.M., Vandenberghe,G.N., Wiaux,V., Verhaegen,S., Ronse,K. SPIE-The International Society for Optical Engineering	11 国際会議録 0.33-k1 ArF lithography for 100-nm DRAM Bok, C.K., Kim, S.-K., Kim, H.-B., Oh, J.-S., Ahn, C.-N., Shin, K.-S. SPIE-The International Society for Optical Engineering
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