Model-based OPC for first-generation 193-nm lithography

Model-based OPC for first-generation 193-nm lithography

著者名:

掲載資料名:

Optical Microlithography XIV

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4346

発行年:

2001

巻:

4346

パート:

One of Two Parts

開始ページ:

119

終了ページ:

130

総ページ数:

12

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819440327 [0819440329]

言語:

英語

請求記号:

P63600/4346

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012062
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical microlithography
回次:	2001 : 14th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2001.02.27-2001.03.02

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1 国際会議録 Reticle quality needs for advanced 193-nm lithography Jonckheere,R.M., Vandenberghe,G.N., Wiaux,V., Verhaegen,S., Ronse,K. SPIE-The International Society for Optical Engineering	7 国際会議録 Assessment of OPC effectiveness using two-dimensional metrics Wiaux, V., Philipsen, V., Jonckheere, R., Vandenberghe, G., Verhaegen, S., Hoffmann, T., Ronse, K., Howard, W.B., … SPIE-The International Society for Optical Engineering
2 国際会議録 ArF lithography options for 100-nm technologies Vandenberghe,G.N., Kim,Y.-C., Delvaux,C., Lucas,K.D., Choi,S.-J., Ercken,M., Ronse,K., Vleeming,B. SPIE-The International Society for Optical Engineering	8 国際会議録 Defect printability for 100-nm design rule using 193-nm lithography Philipsen, V., Jonckheere, R.M., Kohlpoth, S., Torres, A. SPIE-The International Society for Optical Engineering
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