Materials design and development of fluoropolymers for use as pellicles in 157-nm photolithography

Materials design and development of fluoropolymers for use as pellicles in 157-nm photolithography

著者名:

French,R.H. ( DuPont Co. )

掲載資料名:

Optical Microlithography XIV

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4346

発行年:

2001

巻:

4346

パート:

One of Two Parts

開始ページ:

89

終了ページ:

97

総ページ数:

9

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819440327 [0819440329]

言語:

英語

請求記号:

P63600/4346

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012062
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical microlithography
回次:	2001 : 14th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2001.02.27-2001.03.02

類似資料:

1 国際会議録 157-nm pellicles: polymer design for transparency and lifetime French, R.H., Wheland, R.C., Qiu, W., Lemon, M.F., Blackman, G.S., Zhang, E., Gordon, J., Liberman, V., Grenville, A., … SPIE-The International Society for Optical Engineering	7 国際会議録 Materials screening for attenuating embedded phase-shift photoblanks for DUV and 193-nm photolithography Carcia,P.F., French,R.H., Sharp,K.G., Meth,J.S., Smith,B.W. SPIE-The International Society for Optical Engineering
2 国際会議録 157-nm pellicles for photolithography: mechanistic investigation of the deep-UV photolysis of fluorocarbons Lee, K., Jockusch, S., Turro, N.J., French, R.H., Wheland, R.C., Lemon, M.F., Braun, A.M., Widerschpan, T., Zimmerman, … SPIE - The International Society of Optical Engineering	8 国際会議録 TiSi-nitride attenuating phase-shift photomask for 193-nm lithography Reynolds,G.A.M., French,R.H., Carcia,P.F., Torardi,C.C., Hughes,G.P., Jones,D.J., Lemon,M.F., Reilly,M., Wilson,L., … SPIE - The International Society for Optical Engineering
3 国際会議録 Fluoropolyrners for 157-nm lithography:optical properties from VUV absorbance and ellipsometry measurements French,R.H., Wheland,R.C., Jones,D.J., Hilfiker,J.N., Synowicki,R.A., Zumsteg,F.C., Feldman,J., Feiring,A.E. SPIE - The International Society for Optical Engineering	9 国際会議録 New materials for 157-nm photoresists characterization and properties Crawford,M.K., Feiring,A.E., Feldman,J., French,R.H., Periyasamy,M.P., III,F.L.Schadt, Smalley,R.J., Zurnsteg,F.C., … SPIE - The International Society for Optical Engineering
4 国際会議録 Single layer fluropolymer resists for 157-nm lithography Crawford, M.K., Farnham, W.B., Feiring, A.E., Feldman, J., French, R.H., Leffew, K.W., Petrov, V.A., Qiu, W., Schadt, … SPIE-The International Society for Optical Engineering	10 国際会議録 Second generation fluids for 193nm immersion lithography [6154-42] French, R. H., Qiu, W., Yang, M. K., Wheland, R. C., Lemon, M. F., Shoe, A. L., Adelman, D. J., Crawford, M. K., Tran, … SPIE - The International Society of Optical Engineering
5 国際会議録 Behavior of candidate organic pellicle materials under 157-nm laser irradiation Grenville, A., Liberman, V., Rothschild, M., Sedlacek, J.H.C., French, R.H., Wheland, R.C., Zhang, X., Gordan, J. SPIE-The International Society for Optical Engineering	11 国際会議録 Optical superlattices as phase-shift masks for microlithography Carcia,P.F., French,R.H., Reynolds,G.A.M., Hughes,G.P., Torardi,C.C., Reilly,M.H., Lemon,M.F., Miao,C.R., Jones,D.J., … SPIE - The International Society for Optical Engineering
6 国際会議録 157-nm imaging using thick single-layer resists Crawford,M.K., Feiring,A.E., Feldman,J., French,R.H., Petrov,V.A., Schadt Ⅲ,F.L., Smalley,R.J., Zumsteg,F.C. SPIE-The International Society for Optical Engineering	12 国際会議録 Hard pellicle study for 157-nm lithography Shu, E.Y., Lo, F.-C., Eschbach, F.O., Cotte, E.P., Engelstand, R.L., Lovell, E.G., Okada, K., Kikugawa, S. SPIE-The International Society for Optical Engineering

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