Optimization of ArF resist for 100-nm node: DOE and fine-tuning of basic platform
- 著者名:
Kim,K. ( Texas Instruments, Inc. ) Wells,G.M. Kim,W.D. Choi,Y.-J. Choi,S.-J. Kim,Y.-S. Kim,D.-B. - 掲載資料名:
- Advances in Resist Technology and Processing XVIII
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4345
- 発行年:
- 2001
- 巻:
- 4345
- パート:
- One of Two Parts
- 開始ページ:
- 168
- 終了ページ:
- 178
- 総ページ数:
- 11
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819440310 [0819440310]
- 言語:
- 英語
- 請求記号:
- P63600/4345
- 資料種別:
- 国際会議録
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10
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193-nm photoresists at 130-nm node:which lithographic performances for which chemical platform?
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