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Optimization of ArF resist for 100-nm node: DOE and fine-tuning of basic platform

著者名:
Kim,K. ( Texas Instruments, Inc. )
Wells,G.M.
Kim,W.D.
Choi,Y.-J.
Choi,S.-J.
Kim,Y.-S.
Kim,D.-B.
さらに 2 件
掲載資料名:
Advances in Resist Technology and Processing XVIII
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
4345
発行年:
2001
巻:
4345
パート:
One of Two Parts
開始ページ:
168
終了ページ:
178
総ページ数:
11
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819440310 [0819440310]
言語:
英語
請求記号:
P63600/4345
資料種別:
国際会議録

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