Improved lithographic performance of 193-nm photoresists based on cycloolefin/maleic anhydride copolymer by employing mixed PAGs
- 著者名:
Choi,S.-J. ( DongJin Semichem Co., Ltd ) Choi,Y.-J. Kim,Y.-S. Kim,S.-D. Kim,D.-B. Kim,J.-H. Koh,C.-W. Lee,G. Jung,J.-C. Baik,K.-H. - 掲載資料名:
- Advances in Resist Technology and Processing XVIII
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4345
- 発行年:
- 2001
- 巻:
- 4345
- パート:
- One of Two Parts
- 開始ページ:
- 94
- 終了ページ:
- 105
- 総ページ数:
- 12
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819440310 [0819440310]
- 言語:
- 英語
- 請求記号:
- P63600/4345
- 資料種別:
- 国際会議録
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SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |