Scatterometry for shallow trench isolation (STI) process metrology

Scatterometry for shallow trench isolation (STI) process metrology

著者名:

Raymond,C.J. ( Accent Optical Technologies )
Littau,M.E.
Markle,R.J.
Purdy,M.A.

掲載資料名:

Metrology, Inspection, and Process Control for Microlithography XV

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4344

発行年:

2001

開始ページ:

716

終了ページ:

725

総ページ数:

10

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819440303 [0819440302]

言語:

英語

請求記号:

P63600/4344

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012060
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Metrology, inspection, and process control for microlithography
回次:	2001 : 15th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2001.02.26-2001.03.01

類似資料:

1 国際会議録 Novel implementations of scatterometry for lithography process control Littau, M.E., Raymond, C.J., Gould, C.J., Gambill, C. SPIE-The International Society for Optical Engineering	7 国際会議録 Applications of angular scatterometry for the measurement of multiply periodic features Raymond, C.J., Littau, M.E., Youn, B.J., Sohn, C.-J., Kim, J.A., Kang, Y.S. SPIE-The International Society for Optical Engineering
2 国際会議録 Comparison of solutions to the scatterometry inverse problem Raymond, C.J., Littau, M.E., Chuprin, A., Ward, S. SPIE - The International Society of Optical Engineering	8 国際会議録 Production control of shallow trench isolation (STI) at the 130-nm node using spectroscopic ellipsometry-based profile metrology Peters, R.M., Chiao, R.H., Eckert, T., Labra, R., Nappa, D., Tang, S., Washington, J. SPIE - The International Society of Optical Engineering
3 国際会議録 Asymmetric line profile measurement using angular scatterometry Raymond,C.J., Littau,M.E., Pitts,T., Nagy,P. SPIE-The International Society for Optical Engineering	9 国際会議録 Subwavelength photoresist grating metrology using scatterometry M.R. Murnane, C.J. Raymond, S.S.H. Naqvi, J.R. McNeil Society of Photo-optical Instrumentation Engineers
4 国際会議録 Optimization of scatterometry parameters for shallow trench isolation (STI) monitor Leray, P.J., Cheng, S., Kremer, S., Ercken, M., Pollentier, I. SPIE - The International Society of Optical Engineering	10 国際会議録 Characterization and optimization of overlay target design for shallow-trench isolation (STI) process Stephen Hsu, Jason K. Saw, Daniel R. Busath SPIE - The International Society of Optical Engineering
5 国際会議録 Multiparameter process metrology using scatterometry Raymond,C.J., Murnane,M.R., Prins,S.L., Sohail,S., Naqvi,S.H., McNeil,J.R. SPIE-The International Society for Optical Engineering	11 国際会議録 Scatterometer-based scanner fingerprinting technique(ScatterLith) and its applications in image field and ACLV analysis Wang, C., Zhang, G., DeMoor, S.J., Boehm, M.A., Littau, M.E., Raymond, C.J. SPIE-The International Society for Optical Engineering
6 国際会議録 Recursive least squares estimation and its application to shallow trench isolation Wang, J., Qin, S.J., Bode, C.A., Purdy, M.A. SPIE-The International Society for Optical Engineering	12 国際会議録 Successful application of angular scatterometry to process control in sub-100-nm DRAM device Kim, J.-, Kim, S.-J., Chin, S.-B., Oh, S.-H., Goo, D.-H., Lee, S.-J., Woo, S.-G., Cho, H.-K., Han, W.-S., Moon, J.-T., … SPIE - The International Society of Optical Engineering

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