Measurement precision of optical scatterometry

Measurement precision of optical scatterometry

著者名:

Logofatu,P.C. ( CHTM/Univ. of New Mexico )
McNeil,J.R.

掲載資料名:

Metrology, Inspection, and Process Control for Microlithography XV

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4344

発行年:

2001

開始ページ:

447

終了ページ:

453

総ページ数:

7

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819440303 [0819440302]

言語:

英語

請求記号:

P63600/4344

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012060
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Metrology, inspection, and process control for microlithography
回次:	2001 : 15th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2001.02.26-2001.03.01

類似資料:

1 国際会議録 Scatterometry: a metrology for subwavelength surface-relief gratings Logofatu,P.C., McNeil,J.R. SPIE-The International Society for Optical Engineering	7 国際会議録 Sensitivity analysis of fitting for scatterometry Petre-Catalin Logofatu, John R. McNeil SPIE - The International Society of Optical Engineering
2 国際会議録 Ellipsometric scatterometry for sub-0.1-ｦﾌm CD measurements Coulombe,S.A., Logofatu,P.C., Minhas,B.K., Naqvi,S.S.H., McNeil,J.R. SPIE-The International Society for Optical Engineering	8 国際会議録 Resist and etched line profile characterization using scatterometry Raymond,C.J., Naqvi,S.S.H., McNeil,J.R. SPIE-The International Society for Optical Engineering
3 国際会議録 Application of optical scatterometry to microelectronics and flat panel display processing McNeil, J.R., Coulombe, S.A., Logofatu, P.C., Raymond, Christopher J., Naqvi, Sohail H., Collins, G.J. SPIE	9 国際会議録 Rigorous coupled-wave analysis for two-dimensional gratings [5972-26] Logofatu, P.C. SPIE - The International Society of Optical Engineering
4 国際会議録 UV scatterometry Logofatu, P.C. SPIE-The International Society for Optical Engineering	10 国際会議録 Multiparameter process metrology using scatterometry Raymond,C.J., Murnane,M.R., Prins,S.L., Sohail,S., Naqvi,S.H., McNeil,J.R. SPIE-The International Society for Optical Engineering
5 国際会議録 Scatterometry for CD measurements of etched structures Raymond,C.J., Naqvi,S.S.H., McNeil,J.R. SPIE-The International Society for Optical Engineering	11 国際会議録 Subwavelength photoresist grating metrology using scatterometry M.R. Murnane, C.J. Raymond, S.S.H. Naqvi, J.R. McNeil Society of Photo-optical Instrumentation Engineers
6 国際会議録 Multiparameter CD measurements using scatterometry Raymond,C.J., Murnane,M.R., Prins,S.L., Naqvi,S.S.H., McNeil,J.R., Hosch,J.W. SPIE-The International Society for Optical Engineering	12 国際会議録 Large angle measurement by interferometry D. Apostol, C. Blanaru, V. Damian, P.C. Logofatu, R. Tumbar Society of Photo-optical Instrumentation Engineers

1

2

3

4

5

6

7

8

9

10

11

12