Investigation of full-field CD control of sub-100-nm gate features by phase-shift 248-nm lithography
- 著者名:
Fritze,M. ( MIT Lincoln Lab. ) Tyrrell,B. Astolfi,D.K. Davis,P. Wheeler,B. Mallen,R. Jarmolowicz,J. Cann,S.G. Chan,D.Y. Rhyins,P.D. Mastovich,M.E. Sullivan,N.T. Brandom,R. Carney,C. Blachowicz,B.A. - 掲載資料名:
- Metrology, Inspection, and Process Control for Microlithography XV
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4344
- 発行年:
- 2001
- 開始ページ:
- 334
- 終了ページ:
- 343
- 総ページ数:
- 10
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819440303 [0819440302]
- 言語:
- 英語
- 請求記号:
- P63600/4344
- 資料種別:
- 国際会議録
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SPIE-The International Society for Optical Engineering |
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SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |